The product
EXACTUS® Optical Pyrometers by Metivo, part of BASF Group, are engineered to provide consistent, accurate temperature measurements in challenging industrial settings. Their robust design and advanced technology ensure reliable performance. As a result, the pyrometer reduces maintenance needs and enhances process control.
How the EXACTUS® Optical Pyrometer works
Utilizing advanced optics and short-wavelength detection, EXACTUS® pyrometers measure temperature without touching the target. This reduces contamination risk, and the infrared pyrometer delivers accurate readings even on moving or delicate surfaces.
The instrument reaches up to 1,000 readings per second, with a response time of just 1 ms. This way, it provides real-time temperature monitoring, a rapid feedback that is vital for dynamic or fast-changing thermal environments.
Each EXACTUS® unit is a complete temperature measurement system, compact and easy to integrate into existing process setups. Digital and analog outputs, customizable optics and intuitive operation are built in for flexibility and ease of use.
Applications
EXACTUS® Pyrometers are versatile tools suited for a wide range of industrial applications where precise temperature monitoring is critical:
- Semiconductor manufacturing: ensures uniform wafer processing by providing accurate temperature measurements, enhancing product quality and yield.
- Glass production: monitors temperatures in gob, mold and forehearth processes, optimizing glass quality and reducing defects.
- Petrochemical processing: provides reliable temperature data in high-temperature environments, aiding in process optimization and safety.
- Metal heat treatment: delivers precise temperature control during annealing and hardening, ensuring material properties meet specifications.
- Industrial kilns: maintains consistent temperatures in kiln operations, improving product consistency and energy efficiency.
Key advantages
- Exceptional precision and resolution: resolution as fine as 0.001 °C and accuracy within ±1.5 °C, a level of detail critical for semiconductor and advanced manufacturing, where thermal control directly impacts yield and quality.
- Ultra-low drift: as low as 0.1 °C per year, with reliable, repeatable results over extended periods and fewer recalibrations.
- Wide measurement range: from as low as 25 °C up to 3,000 °C, for semiconductor wafer processing, glass manufacturing, solar cell production and heat treating.
- Customizable configurations for diverse applications.
- Manufacturing quality: each instrument is manufactured in ISO-certified facilities and undergoes rigorous calibration and quality checks.
